Deionized water production installation
Deionized water is used in microelectronics for production of printed circuit boards, semiconductor elements and integrated circuits, etc.
It is possible to modify the installation in accordance with individual requirements of the customer. Purified water exceeds "A" grade regulations.
The source water contains a significant amount of iron (incl. oxidizable ferrous) and some manganese.
The quality of deionized water produced by the installation exceeds the grade “A” water requirements of ost 11.029.003-80 with respect to the content of suspended particles and dissolved gases, as well as dimensions of suspended particles - particles more than 0.02 µm in size are practically absent.
The installation uses an energy-saving degassing layout which utilizes the energy of the reverse osmosis concentrate flow.
|Water treatment unit||2000x800x1800 mm|
|Deionization unit||1000x400x14000 mm|
|Installation performance||50 l/h|
|Reserve volume of deionized water||500 l|
|Raw water consumption average/peak||170/2000 l/h|
|Drainage water discharge average/peak||120/960 l/h|
|Electric power||1.7/5.4 kW|
|Power supply||380 V, 50 Hz|
|Installation weight||931 kg||Treater water meets the requirements of OST 11.029.003-80* grade "A" water|
Parameters of water purification
|Indicators||Unit of measurement||Actual value||Grade "A" according to OST 11.029.003-80|
|Resistivity at temp. 18...22°C||MOhm cm||at least 18||at least 18|
|Permanganate oxidation||mg/l||no more than 0.5||no more than 1.0|
|Silicic acid content SiO32-||mg/l||no more than 0.01||no more than 0.01|
|Iron content||mg/l||no more than 0.002||no more than 0.015|
|Copper content||mg/l||no more than 0.002||-|
|Microbial content||colonies/ml||no more than 1||no more than 2|
|Microparticle content 1...5 µm||pcs/ml||no more than 2||no more than 20|
|Total organic carbon (T°C)||mg/l||no more than 0.5||-|